Welcome to the City University of New York Advanced Science Research Center NanoFabrication Facility! The CUNY ASRC NanoFab is a shared research space open to students, faculty, research staff, government, and industrial partners. The NanoFab enables the fabrication and characterization of a wide range of structures and houses a comprehensive set of tools that aid researchers in developing novel micro and nanoscale devices, such as, nanophotonic and solid state circuits, microelectromechanical systems, and microfluidic systems.
The NanoFab is comprised of a 5,000 square feet of ISO 6 (Class 1,000) and ISO 5 (Class 100) cleanroom space and contains additional lab space for back-end processing and support areas. All tools are configured to handle at least 4-inch wafers, and most tools have 6-inch wafer handling capability. Our major instruments include a high-end electron beam lithography writer, a field emission SEM, a chlorine based inductively coupled plasma etcher, a metal and oxide deposition equipment, advanced metrology equipment, and a three-dimensional micro and nano laser lithography system. This direct laser writing system allows for fabrication of complex shaped polymer structures with finest feature sizes in the sub-micrometer range.
The ASRC NanoFab is also supported by an imaging suite, that consists of a cryogenic TEM for life sciences, a materials science TEM, a training TEM, and a dual beam SEM / FIB / Nanomanipulator system for sample preparation. For users, the NanoFab provides an opportunity to carry out hands on research with some of the world’s most sophisticated instruments for the fabrication and characterization of materials at the micro and nanoscale.