EQUIPMENT TYPE
Spin Rinse Dryer
MANUFACTURER
OEM
MODEL
470S
LOCATION
Plasma Bay
PROCESSES
Rinse and dry 4″ and 6″ wafers
The spin rinse dryer offers a fast way to clean and dry wafers in patches up to 25 wafers at a time.
Spin Rinse Dryer
OEM
470S
Plasma Bay
Rinse and dry 4″ and 6″ wafers
The spin rinse dryer offers a fast way to clean and dry wafers in patches up to 25 wafers at a time.