Electron Beam Lithography (EBL)
The Elionix ELS-G100 is a high speed, ultra high precision thermal field emission electron beam lithography system. The ELS-G100 is capable of generating patterns with a line width of 6nm. The system provides a stable 1.8nm electron beam using high beam current at 100kV.
A laser interferometer stage, with reading resolution of 0.31nm, enables a stitching accuracy of 15nm and overlay accuracy of 20nm. Significantly small distortion enables uniform and stable fine pattern writing over large writing fields. Uniform 10nm lines can be drawn from the edge to the edge of a 500_m field without stitching. At a beam current of 1nA, 20nm lines can be written over an entire 500_m field without stitching. No stitching guarantees accuracy and eliminating the need for stage movement enhances writing speed.