Nanoscribe 3D Lithography System

Equipment Type

3D Lithography System

Manufacturer

Nanoscribe GmbH

Model

Photonic Professional GT

Location

Lithography Bay

Processes

Compatible Materials Nanoscribe resists : IP-L (780), IP-G (780) and IP-Dip SU-8 (25, 50, 100, …) Ormocere AZ MiR 701, AR-P 3210 AZ 5214, AZ 9260 Chalcogenide glass (As2S3) PEG-DA, PETA And many others …

The Nanoscribe Photonic Professional is an easy-to-operate table-top laser lithography system that enables the fabrication of true three-dimensional nanostructures using commercially available photoresists. Designed for the fabrication of photonic crystal structures, the instrument is also ideal for, e.g., generating three-dimensional scaffolds for biology, micro- and nanofluidic circuitry.

Specifications

Optics and Resolution

  • Class 3 120 mW, 780 nm, 150 fs, 80 MHz fiber laser
  • 3D lateral feature size: ≤ 200 nm; typically 150 nm
  • 2D lateral feature size: ≤ 150 nm; typically 120 nm
  • 2D lateral resolution: ≤ 500 nm; typically 300 nm
  • Vertical resolution: ≤ 1 μm; typically 800 nm
  • Piezo range: 300 x 300 x 300 μm3
  • Motorized xy-scanning stage range: 100 x 100 mm2