SPTS Xactix e1 Xenon Difluoride Etcher

Equipment Type

Xenon Difluoride Etcher

Manufacturer

SPTS

Model

e1

Location

Plasma Bay

Processes

Isotropically etch Si, Ge, and Mo films and release layers

Xenon Difluoride can be used to isotropically etch Si, Ge, and Mo films. The XeF2 etch chemistry offers excellent selectivity to a wide range of materials, such as Al, SiO2, ZnO, Si3N4, and photoresist affording the possibility of using thin masks and incorporating etch-stop layers for undercutting.