Atomic Layer Deposition (ALD)
Films: Al2O3, HfO2, TiO2, TiN, ZnO, MgO, ZrN
Fiji system is a load-locked ALD system capable of both thermal and plasma-enhanced depositions of various dielectric and metallic films. The use of remote plasma activations is essential for the deposition of high quality nitrides. Also, plasma activation of oxide precursors generally enhances film nucleation on non-standard substrates.