Chemical Name Hazardous Components

ACIDS

Hydrofluoric Acid, 48 to 51% solution in water Hydrofluoric acid
Buffered Oxide Etch 6:1 Ammonium fluoride, Hydrofluoric acid
Nitric Acid, 60% solution in water Nitric acid
Sulfuric Acid, 96% solution in water Sulfuric acid
Hydrochloric Acid, 37% solution in water Hydrochloric acid
Acetic Acid, 99.5% pure Acetic acid

BASES

Ammonium Hydroxide Ammonium hydroxide
Potassium Hydroxide Potassium hydroxide
TMAH Tetramethylammonium hydroxide

OXIDIZERS

Hydrogen Peroxide Hydrogen peroxide

SOLVENTS

Isopropyl Alcohol Isopropyl Alcohol
Acetone Acetone
Methanol Methanol
Ethanol Ethanol
Anisole Anisole
Chlorobenzene Chlorobenzene
DMAD Dimethylacetamide
HMDS Hexamethyldisilazane
Remover PG 1-methyl-2-pyrrolidinone, Pyrrolidinone compound

METAL ETCHANTS

Aluminum Etchant Phosphoric acid, Acetic acid, Nitric acid
Chromium Etchant Nitric acid, Ceric ammonium nitrate
Gold Etchant Iodine, potassium iodide
Nickel Etchant Nitric acid, Potassium perfluoroalkyl sulfonate

PHOTORESISTS

SU-8 2 Cyclopentanone, epoxy resin, bis-triarysulfonium, sulfonium hexafluoroantimonate salts
SU-8 2000.5 Cyclopentanone, epoxy resin, bis-triarysulfonium, sulfonium hexafluoroantimonate salts
AZ MiR 701 Photoresist Ethyl lactate, n-Butyl acetate
AZ AZ 1512 Photoresist 917 MIF & IN 1-Methoxy-2-propanol acetate, Diazonaphthoquinonesulfonic esters, 2-Methoxy-1-propanol acetate
AZ 5214-E Photoresist 1-Methoxy-2-propanol acetate, Diazonaphthoquinonesulfonic esters, 2-Methoxy-1-propanol acetate
AZ P4620 Photoresist 1-Methoxy-2-propanol acetate, Diazonaphthoquinonesulfonic esters, 2-Methoxy-1-propanol acetate
Megaposit SPR 220-3.0 Positive Photoresist Ethyl lactate, Anisole, Diazo photoactive compound, Cresol novolak resin, Cresol, 2-methyl butyl acetate, N-amyl acetate, Organic siloxane surfactant
Megaposit SPR 220-7.0 Positive Photoresist Ethyl lactate, Anisole, Diazo photoactive compound, Cresol novolak resin, Cresol, 2-methyl butyl acetate, N-amyl acetate, Organic siloxane surfactant

PHOTORESIST DEVELOPERS

AZ 726 MIF Developer Tetramethylammonium hydroxide
AZ 400K Developer 4:1 Potassium borates
Megaposit MF-24A Developer Tetramethylammonium hydroxide
SU-8 Developer 1-methoxy-2-propanol acetate

3D LITHOGRAPHY RESISTS

IP-L 780 Photoresist * proprietary*
IP-Dip Photoresist * proprietary*

ELECTRON BEAM RESISTS

495 PMMA A2 Poly(methylmethacrylate), Anisole
495 PMMA A4 Poly(methylmethacrylate), Anisole
495 PMMA A6 Poly(methylmethacrylate), Anisole
950 PMMA A2 Poly(methylmethacrylate), Anisole
950 PMMA A4 Poly(methylmethacrylate), Anisole
MMA (8.5) MAA EL 12 Poly(methylmethacrylate), Ethyl lactate
ma-N 2403 Negative Photoresist Cyclopentanone, Anisole
ZEP 520A Anisole, Methyl styrene, Chloromethyl acrylate copolymer

ELECTRON BEAM DEVELOPERS

Amyl Acetate n-Amyl Acetate
Hexanes Hexanes
MIBK 4-methyl-2-pentanone
MIBK:IPA 4-methyl-2-pentanone, Isopropyl alcohol
o-Xylene Xylene
Microposit MF-319 Developer Tetramethylammonium hydroxide, Surfactant
Microposit MF-321 Developer Tetramethylammonium hydroxide, Surfactant
AZ 300 MIF Developer Tetramethylammonium hydroxide

ALD PRECURSORS

TMA Trimethylaluminum
DEZ Diethylzinc
TDMAH Tetrakis(dimethylamino)hafnium
BECM Bis(ethylcyclopentadienyl)magnesium
TDEAT Tetrakis(diethylamino)titanium(IV)
TDMAZ Tetrakis(dimethylamino)zirconium(IV)

DEPOSITION METALS

Aluminum Pellets Aluminum (Al)
Chromium Pieces Chromium (Cr)
Cobalt Pellets Cobalt (Co)
Copper Pellets Copper (Cu)
Germanium Pieces Germanium (Ge)
Gold Pellets Gold (Au)
Indium Pellets Indium (In)
Iron Pellets Iron (Fe)
Nickel Pellets Nickel (Ni)
Niobium Pellets Niobium (Nb)
Palladium Shot Palladium (Pd)
Permalloy Pellets Iron (Fe), Nickel (Ni)
Platinum Pellets Platinum (Pt)
Silver Pellets Silver (Ag)
Titanium Pellets Titanium (Ti)

SPUTTERING TARGETS

Aluminum Target Aluminum (Al)
Chromium Target Chromium (Cr)
Copper Target Copper (Cu)
Indium Tin Oxide Target Indium tin oxide (ITO)
Molybdenum Disilicate Target Molybdenum disilicate (MoSi2)
Nickel Target Nickel (Ni)
Silicon (Undoped) Target Silicon (Si)
Silicon Nitride Target Silicon nitride (Si3N4)
Titanium Target Titanium (Ti)
Titanium Nitride Target Titanium nitride (TiN)
Tungsten Target Tungsten (W)
Zinc Oxide Target Zinc Oxide (ZnO)

Miscellany

Pelco Bell Jar Kleen Calcium Carbonate, Sodium Carbonate, Feldspar
Chloramin-T Chloramin-T
Fomblin NA
JUN-AIR SJ27F NA
Immersol 518 F Adipic acid-di ester, Benzyl benzoate
SurPass 3000 NA
Ultra 19 Vacuum Oil NA
Weld On Methylene Chloride , n-hexane, Cyclohexane